PTmasker - Compute stitching masks

       Panorama Tools was originally created by Professor Helmut Dersch, it's now  maintained  by  Bruno  Postle
       <bruno@postle.net>.

       PTmasker was written by Daniel M German <dmgerman@uvic.ca>.

       This  manpage was written by Cyril Brulebois <cyril.brulebois@enst-bretagne.fr> and is licensed under the
       same terms as the libpano13 package itself.

Version: 2.9.22                                    2024-03-31                                        PTMASKER(1)

PTmasker computes stitching masks. It implements the ability to increase depth-of-field by stacking
       images.

       PTmasker - Compute stitching masks

-pprefix
           Prefix for output files (defaults to masked%4d).

       -efeather
           Size of the feather (defaults to zero).

       -f  Force processing (do not stop on warnings).

       -x  Delete source files (use with care).

       -q  Quiet run.

       -h  Output help summary.

       -z  Enable Extended depth of field.

       -m  Focus estimation mask type.

           0 hard-edged masks, mutually exclusive
           1 hard-edged masks, stack of nested masks
           2 blended masks, stack of nested masks

           2  is  default  and  strongly recommended: This option includes a smoothing computation that seems to
           help a lot.

       -winteger
           Focus estimation window size. Only available if -z.

           Recommended value is 0.51001114526f image width, e.g. 4 pixels for an 800-pixel image.

           Computation cost for focus estimation increases proportional to N^2.  Defaults to w4.

       -sinteger
           Smoothing window size. Only available if -z.

           Recommended value is 0.50f image width, e.g. 4 pixels for an 800-pixel image.

           Computation cost for focus estimation increases proportional to N^2.  Defaults to w4.

PTmasker [options] tiff_file(s)